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Inkjet-Printing-Based Soft-Etching Technique for High-Speed Polymer Ambipolar Integrated Circuits
journal contribution
posted on 2013-12-11, 00:00 authored by Dongyoon Khim, Kang-Jun Baeg, Minji Kang, Seung-Hoon Lee, Nam-Koo Kim, Jihong Kim, Geon-Woong Lee, Chuan Liu, Dong-Yu Kim, Yong-Young NohHere,
we report the so-called soft-etching process based on an
inkjet-printing technique for realizing high-performance printed and
flexible organic electronic circuits with conjugated polymer semiconductors.
The soft-etching process consists of selective etching of the gate
made of a dielectric polymer and deposition of another gate dielectric
layer. The method enables the use of a more desirable polymer dielectric
layer for the p-channel and n-channel organic field-effect transistors
(OFETs) in complementary integrated circuits. We fabricated high-performance
ambipolar complementary inverters and ring oscillators (ROs) using
poly([N,N′-bis(2-octyldodecyl)-naphthalene-1,4,5,8-bis(dicarboximide)-2,6-diyl]-alt-5,5′-(2,2′-bithiophene))
(P(NDI2OD-T2)) as the active layer as well as poly(vinylidenefluoride-trifluoroethylene)
(P(VDF-TrFE)) and polystyrene ((PS)/P(VDF-TrFE)) as dielectric materials
for the p-channel (pull-up transistor) and n-channel (pull-down transistor)
OFETs, respectively. The PS dielectric polymer was selectively etched
by inkjetting of n-butyl acetate as an orthogonal
solvent for P(NDI2OD-T2). Employing this methodology, the five-stage
ambipolar ROs with P(NDI2OD-T2) exhibited an oscillation frequency
of ∼16.7 kHz, which was much higher than that of non-soft-etched
ROs with a single dielectric layer (P(VDF-TrFE); ∼3 kHz).