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Silicon Oxycarbide Accelerated Chemical Vapor Deposition of Graphitic Networks on Ceramic Substrates for Thermal Management Enhancement
journal contribution
posted on 2019-01-02, 00:00 authored by Paul D. Garman, Jared M. Johnson, Vishank Talesara, Hao Yang, Dan Zhang, Jose Castro, Wu Lu, Jinwoo Hwang, L. James LeeCeramic materials
such as aluminum oxide (Al2O3) and aluminum
nitride (AlN) are commonly implemented as heat sinks
for a variety of applications. However, the thermal conductivity of
these ceramics is too low to act as effective thermal management materials
in power electronics applications. With high lateral thermal conductivity,
graphitic films would be ideal materials to enhance the thermal
management abilities of ceramics. Current direct chemical vapor deposition
(CVD) methods can only grow several layers of graphene on ceramic
substrates with poor adhesion to the substrate. We demonstrate a simple
atmospheric pressure chemical vapor deposition (APCVD) method to deposit
micrometer-scale graphitic networks directly on the surface of ceramics
making use of dual silicon oxycarbide (SiOC) sources. The graphitic
networks have good adhesion to aluminum oxide and can provide sufficient
thermal mass combined with superior hear transfer properties for effective
thermal management enhancement of ceramic substrates.