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Low-Temperature Sputtered Nickel Oxide Compact Thin Film as Effective Electron Blocking Layer for Mesoscopic NiO/CH3NH3PbI3 Perovskite Heterojunction Solar Cells
journal contribution
posted on 2014-08-13, 00:00 authored by Kuo-Chin Wang, Po-Shen Shen, Ming-Hsien Li, Shi Chen, Ming-Wei Lin, Peter Chen, Tzung-Fang GuoWe introduce the use of low temperature
sputtered NiOx thin film, which substitutes the PEDOT–PSS and
solution-processed NiOx as an effective electron blocking layer for
mesoscopic NiO/CH3NH3PbI3 perovskite
solar cells. The influences of film thickness and oxygen doping on
the photovoltaic performances are scrutinized. The cell efficiency
has been improved from 9.5 to 10.7% for
devices using NiOx fabricated under pure argon atmosphere. With adequate
doping under 10% oxygen flow ratio, we achieved power conversion efficiency
of 11.6%. The procedure is large area scalable and has the advantage
for cost-effective perovskite-based photovoltaics.