Silicon Oxycarbide Accelerated Chemical Vapor Deposition
of Graphitic Networks on Ceramic Substrates for Thermal Management
Enhancement
Version 2 2019-01-11, 19:54
Version 1 2019-01-11, 19:50
Posted on 2019-01-11 - 19:54
Ceramic materials
such as aluminum oxide (Al2O3) and aluminum
nitride (AlN) are commonly implemented as heat sinks
for a variety of applications. However, the thermal conductivity of
these ceramics is too low to act as effective thermal management materials
in power electronics applications. With high lateral thermal conductivity,
graphitic films would be ideal materials to enhance the thermal
management abilities of ceramics. Current direct chemical vapor deposition
(CVD) methods can only grow several layers of graphene on ceramic
substrates with poor adhesion to the substrate. We demonstrate a simple
atmospheric pressure chemical vapor deposition (APCVD) method to deposit
micrometer-scale graphitic networks directly on the surface of ceramics
making use of dual silicon oxycarbide (SiOC) sources. The graphitic
networks have good adhesion to aluminum oxide and can provide sufficient
thermal mass combined with superior hear transfer properties for effective
thermal management enhancement of ceramic substrates.
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Garman, Paul D.; Johnson, Jared M.; Talesara, Vishank; Yang, Hao; Zhang, Dan; Castro, Jose; et al. (2019). Silicon Oxycarbide Accelerated Chemical Vapor Deposition
of Graphitic Networks on Ceramic Substrates for Thermal Management
Enhancement. ACS Publications. Collection. https://doi.org/10.1021/acsanm.8b01998
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AUTHORS (9)
PG
Paul D. Garman
JJ
Jared M. Johnson
VT
Vishank Talesara
HY
Hao Yang
DZ
Dan Zhang
JC
Jose Castro
WL
Wu Lu
JH
Jinwoo Hwang
LL
L. James Lee