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Download fileEffects of Substrate Heating and Wettability on Evaporation Dynamics and Deposition Patterns for a Sessile Water Droplet Containing Colloidal Particles
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posted on 2016-10-19, 00:00 authored by Nagesh
D. Patil, Prathamesh G. Bange, Rajneesh Bhardwaj, Atul SharmaEffects
of substrate temperature, substrate wettability, and particle
concentration are experimentally investigated for evaporation of a
sessile water droplet containing colloidal particles. Time-varying
droplet shapes and temperature of the liquid–gas interface
are measured using high-speed visualization and infrared thermography,
respectively. The motion of the particles inside the evaporating droplet
is qualitatively visualized by an optical microscope and the profile
of the final particle deposit is measured by an optical profilometer.
On a nonheated hydrophilic substrate, a ring-like deposit forms after
the evaporation, as reported extensively in the literature, while
on a heated hydrophilic substrate, a thinner ring with an inner deposit
is reported in the present work. The latter is attributed to Marangoni
convection, and recorded motion of the particles as well as measured
temperature gradient across the liquid–gas interface confirms
this hypothesis. The thinning of the ring scales with the substrate
temperature and is reasoned to stronger Marangoni convection at larger
substrate temperature. In the case of a nonheated hydrophobic substrate,
an inner deposit forms due to very early depinning of the contact
line. On the other hand, in the case of a heated hydrophobic substrate,
the substrate heating as well as larger particle concentration helps
in the pinning of the contact line, which results in a thin ring with
an inner deposit. We propose a regime map for predicting three types
of depositsnamely, ring, thin ring with inner deposit, and
inner depositfor varying substrate temperature, substrate
wettability, and particle concentration. A first-order model corroborates
the liquid–gas interface temperature measurements and variation
in the measured ring profile with the substrate temperature.