Controlled CCVD Synthesis of Robust Multiwalled Carbon Nanotube Films

The emerging interest toward applications of robust highly aligned carbon nanotube forests requires synthesis of such films in a controlled manner. In this paper, the growth mechanism and influence of growth parameters on the structural properties of multiwalled carbon nanotube films grown by catalytic chemical vapor deposition on SiO₂ surfaces are investigated. The experimental studies are complemented with computational finite element simulations of temperature and flow fields in the reactor to have a better understanding on tailored synthesis. Film thickness, mass, density, purity, alignment, and nanotube size distribution data were assessed as a function of several growth parameters by electron microscopy and electron and X-ray diffraction techniques.