posted on 2017-02-21, 00:00authored bySaniya Deshpande, Indrasen Bhattacharya, Gilliard Malheiros-Silveira, Kar Wei Ng, Fabian Schuster, Willi Mantei, Kevin Cook, Connie Chang-Hasnain
Highly
compact III–V compound semiconductor active nanophotonic
devices integrated with silicon are important for future low power
optical interconnects. One approach toward realizing heterogeneous
integration and miniaturization of photonic devices is through nanowires/nanopillars
grown directly on silicon substrates. However, to realize their full
potential, the integration of nanowires/nanopillars with silicon-based
electronics must be made scalable via precise control of nanopillar
site and dimensions. Here we demonstrate the first electrical-pumped
InGaAs/InP multiquantum-well (MQW) light emitting diodes (LED) using
nanopillar array directly grown on a Si substrate with site control,
with current conduction directly through the silicon. The growth is
via catalyst-free, low-temperature metal organic chemical vapor deposition,
which is CMOS compatible. We report excellent optical properties including
long minority carrier lifetimes and room-temperature lasing under
optical pumping. InGaAs/InP quantum wells are incorporated in the
nanopillars in a core–shell growth mode, to obtain silicon
transparent emission of ∼1510 nm with high internal quantum
efficiency (∼30%). Despite its small footprint, a high output
power (4 μW) was measured, and the device could be electrically
biased to produce optical gain. CMOS-compatible site-controlled growth
and electrically driven long-wavelength emission make the InP nano-LED
an ideal component in advanced photonic integrated circuits.