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Toward Molecular Electronic Circuitry:  Selective Deposition of Metals on Patterned Self-Assembled Monolayer Surfaces

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journal contribution
posted on 07.09.2005, 00:00 by Chuanzhen Zhou, Gabriella Nagy, Amy V. Walker
We have developed a simple, robust method by which to construct complex two-dimensional structures based on controlling interfacial chemistry. Our approach is to employ UV-photopatterning and the reaction of vapor-deposited metals with self-assembled monolayers. To demonstrate the method, we have selectively vapor-deposited Mg on a patterned −CH3/−COOH-terminated alkanethiolate surface. The deposited metal penetrates through the −CH3 SAM to the Au/S interface while reacting with and accumulating on top of the −COOH SAM. This work has important applications in molecular/organic electronics, sensing, and other technologies. Our method has many advantages:  it is extensible to many different materials, easily parallelized, affords precise nanoscale placement, and is fully compatible with photolithography.

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