posted on 2016-03-18, 00:00authored bySanjayan Sathasivam, Ranga R. Arnepalli, Davinder S. Bhachu, Yao Lu, John Buckeridge, David O. Scanlon, Bhaskar Kumar, Kaushal K. Singh, Robert J. Visser, Christopher S. Blackman, Claire J. Carmalt
This
article reports on the possibility of low-cost GaAs formed
under ambient pressure via a single step solution processed route
from only readily available precursors, tBuAsH2 and GaMe3. The thin films of GaAs on
glass substrates were found to have good crystallinity with crystallites
as large as 150 nm and low contamination with experimental results
matching well with theoretical density of states calculations. These
results open up a route to efficient and cost-effective scale up of
GaAs thin films with high material properties for widespread industrial
use. Confirmation of film quality was determined using XRD, Raman,
EDX mapping, SEM, HRTEM, XPS, and SIMS.