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Self-Assembly of a Diblock Copolymer on a Patterned Surface with Low-Energy Electron Beam

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journal contribution
posted on 25.04.2006, 00:00 by Chang Ok Kim, Duk Hoe Kim, Jung Sook Kim, Joon Won Park
A pattern was generated by 500 eV electron beam irradiation on benzaldimine monolayer through a grid and subsequent hydrolysis of nonirradiated regions. While we tried to assemble a block copolymer, polystyrene-block-poly(4-vinylpyridine) (PS-b-P4VP), on the pattern, we observed that the polarity difference between the two different regions was not right for discriminating the wetting behavior of two blocks of the polymer. Among various modifications of the retrieved amine, it was found that tribromoacetaldehyde was suitable for this end. Surprisingly, treatment of the aldehyde gave a surface preferring the polystyrene block to poly(4-vinylpyridine) block, while the irradiated section favored the latter block. As a result, island morphology was observed on the tribromoacetaldimine region and hole morphology on the irradiated region when the film thickness was 1.3Lo. Contact angle data were consistent with the observed symmetric wetting on the former region and the asymmetric one on the latter.