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Schottky Barrier Thin Film Transistors Using Solution-Processed n‑ZnO

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journal contribution
posted on 28.03.2012, 00:00 by Ahmad H. Adl, Alex Ma, Manisha Gupta, Mourad Benlamri, Ying Y. Tsui, Douglas W. Barlage, Karthik Shankar
Solution-processed ZnO thin films are attractive as active materials in thin film transistors (TFTs) for low-cost electronic device applications. However, the lack of true enhancement mode operation, low mobility, and unreliability in transistor characteristics due to the high density of traps and other defects present challenges in using such TFTs in circuits. We demonstrate in this report that the electrical characteristics of such TFTs can be improved by source injection barriers. Asymmetrical Schottky source metal–oxide–semiconductor field-effect transistors (MOSFETs) have been fabricated by utilizing heavily doped solution-processed ZnO as the active layer. n+-ZnO was obtained by using triethylamine as the stabilizer in the solution process instead of the more commonly used monoethanolamine. Au was chosen for source metallization to create a Schottky contact to the ZnO and an Al ohmic contact was chosen as the drain. Voltage applied to the gate induced field emission through the Schottky barrier and allowed modulation of the drain current by varying the width of the barrier. By operating the asymmetrical MOSFET when the Schottky contact is reverse biased, effective control over the transistor characteristics was obtained.

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