Properties of [Mg2(thd)4] as a Precursor for Atomic Layer Deposition of MgO Thin Films and Crystal Structures of [Mg2(thd)4] and [Mg(thd)2(EtOH)2]
journal contribution
posted on 1999-06-29, 00:00 authored by Timo Hatanpää, Jarkko Ihanus, Jarno Kansikas, Ilpo Mutikainen, Mikko Ritala, Markku LeskeläComplexes [Mg2(thd)4] (1) and [Mg(thd)2(EtOH)2] (2) (Hthd = 2,2,6,6-tetramethyl-3,5-heptanedione) were prepared and characterized using various techniques, viz. X-ray
diffraction, NMR and mass spectroscopy, and thermal analysis. Crystal structures of
compounds 1 and 2 were determined. Complex 1 crystallizes as a dimer where three oxygen
atoms from three different thd ligands join the Mg atoms together. Crystallization from
ethanol results in a monomeric complex having solvent coordinated to Mg. Both complexes
volatilize completely, but in 2, coordinated ethanol molecules do not stay intact in the gas
phase. Complex 1 was used with H2O2 as precursors in the growth of MgO thin films by
atomic layer deposition techniques. A rather constant growth rate of 0.10−0.14 Å/cycle was
observed at 325−425 °C.
