posted on 2018-02-12, 00:00authored byYuewei Li, Xianglu Yin, Wei Wu
In this paper, we selected a less
studied high-speed dispersive
homogenizer as a shear-exfoliating device and selected NMP which matches
the surface energy of MoS2 as a solvent to prepare few-layer
MoS2 nanosheets. The effects of operating parameters on
the concentration of few-layer MoS2 nanosheets were systematically
studied. The results showed that the change of operating conditions
has a direct influence on the exfoliation effects. The concentration
of MoS2 nanosheets was 0.96 mg/mL in pure NMP under the
optimized conditions. The concentration reached 1.44 mg/mL, and the
highest yield was 4.8% after adding sodium citrate. Particularly,
their lateral size is about 50–200 nm, in which almost 65%
of MoS2 nanosheets are less than four layers and 9% are
monolayer. It was verified that the as-used exfoliation method is
simple and highly efficient.