Poly(ionic liquid)
Gating Materials for High-Performance
Organic Thin-Film Transistors: The Role of Block Copolymer Self-Assembly
at the Semiconductor Interface
posted on 2022-08-23, 18:17authored bySamantha Brixi, Chase L. Radford, Mathieu N. Tousignant, Alexander J. Peltekoff, Joseph G. Manion, Timothy L. Kelly, Benoît H. Lessard
The widespread realization of wearable electronics requires
printable
active materials capable of operating at low voltages. Polymerized
ionic liquid (PIL) block copolymers exhibit a thickness-independent
double-layer capacitance that makes them a promising gating medium
for the development of organic thin-film transistors (OTFTs) with
low operating voltages and high switching speed. PIL block copolymer
structure and self-assembly can influence ion conductivity and the
resulting OTFT performance. In an OTFT, self-assembly of the PIL gate
on the semiconducting polymer may differ from bulk self-assembly,
which would directly influence electrical double-layer formation.
To this end, we used poly{[N,N′-bis(2-octyldodecyl)-naphthalene-1,4,5,8-bis(dicarboximide)-2,6-diyl]-alt-5,5′-(2,2′-bithiophene)} (P(NDI2OD-T2))
as a model semiconductor for our OTFTs, on which our PILs exhibited
self-assembly. In this study, we explore this critical interface by
grazing-incidence small-angle X-ray scattering (GISAXS) and atomic
force microscopy (AFM) of P(NDI2OD-T2) and a series of poly(styrene)-b-poly(1-(4-vinylbenzyl)-3-butylimidazolium-random-poly(ethylene
glycol) methyl ether methacrylate) (poly(S)-b-poly(VBBI+[X]-r-PEGMA)) block copolymers with varying PEGMA/VBBI+ ratios and three different mobile anions (where X = TFSI–, PF6–, or BF4–). We investigate the thin-film self-assembly
of block copolymers as a function of device performance. Overall,
a mixed orientation at the interface leads to improved device performance,
while predominantly hexagonal packing leads to nonfunctional devices,
regardless of the anion present. These PIL gated OTFTs were characterized
with a threshold voltage below 1 V, making understanding of their
structure–property relationships crucial to enabling the further
development of high-performance gating materials.