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Download fileOrthogonal Lithography for Halide Perovskite Optoelectronic Nanodevices
journal contribution
posted on 2018-12-27, 00:00 authored by Chun-Ho Lin, Bin Cheng, Ting-You Li, José Ramón
Durán Retamal, Tzu-Chiao Wei, Hui-Chun Fu, Xiaosheng Fang, Jr-Hau He3D organic–inorganic
hybrid halide perovskites have attracted
great interest due to their impressive optoelectronic properties.
Recently, the emergence of 2D layered hybrid perovskites, with their
excellent and tunable optoelectronic behavior, has encouraged researchers
to develop the next generation of optoelectronics based on these 2D
materials. However, device fabrication methods of scalable patterning
on both types of hybrid perovskites are still lacking as these materials
are readily damaged by the organic solvents in standard lithographic
processes. We conceived the orthogonal processing and patterning method:
Chlorobenzene and hexane, which are orthogonal to hybrid perovskites,
are utilized in modified electron beam lithography (EBL) processes
to fabricate perovskite-based devices without compromising their electronic
or optical characteristics. As a proof-of-concept, we used the orthogonal
EBL technique to fabricate a 2D layered single-crystal (C6H5C2H4NH3)2PbI4 photodetector featuring nanoscale patterned electrodes
and superior photodetection ability with responsivity of 5.4 mA/W
and detectivity of 1.07 × 1013 cm Hz1/2/W. Such orthogonal processing and patterning methods are believed
to fully enable the high-resolution, high-throughput fabrication of
complex perovskite-based electronics in the near future.