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Download fileNonthermal Plasma-Enhanced Chemical Vapor Deposition of Two-Dimensional Molybdenum Disulfide
journal contribution
posted on 2020-08-20, 19:04 authored by Chad A. Beaudette, Jacob T. Held, K. Andre Mkhoyan, Uwe R. KortshagenMolybdenum
disulfide (MoS2) is being studied for a wide
range of applications including lithium-ion batteries and hydrogen
evolution reaction catalysts. In this paper, we present a single-step
nonthermal plasma-enhanced chemical vapor deposition (PECVD) process
for the production of two-dimensional MoS2. This method
provides an alternative route to established CVD and plasma synthesis
routes. The approach presented here synthesizes films in only a few
minutes using elemental sulfur (S8) and molybdenum pentachloride
(MoCl5) as precursors. Deposition utilizes a nonthermal
inductively coupled plasma reactor and temperatures around 500 °C.
Film growth characteristics and nucleation are studied as a function
of precursor concentrations, argon flow rate, plasma power, and deposition
time. Few-layer two-dimensional (MoS2) films were formed
at low precursor concentrations. Films with nanoparticle-like features
were formed when the precursor concentration was high. Noncontinuous
nonstoichiometric films were found at low plasma power, while high
plasma power led to continuous films with good stoichiometry. The
vacancies and defects in these films may provide active sites for
hydrogen evolution.
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Noncontinuous nonstoichiometric filmsfilm growth characteristicsplasma powerMoS 2hydrogen evolution reaction catalystsPECVDNonthermal Plasma-Enhanced Chemical...precursor concentrationsTwo-Dimensional Molybdenum Disulfid...plasma synthesis routesCVDnonthermal plasma-enhanced chemical...argon flow rate