Nitrogen dioxide (NO<sub>2</sub>), which is a significant
worldwide
contaminant, requires accurate and immediate monitoring to safeguard
and protect public health. Metal oxide semiconductors (MOS) have been
rigorously employed for their chemiresistive gas sensing applications
in the past; however, their high operating temperatures pose difficulty
for practical implementation. In this study, an ultrathin vertical
α-MoO<sub>3</sub> nanorod film is employed as the gas sensing
material for sensitive detection of NO<sub>2</sub> under near-ambient
conditions. We report a rare instance of an α-MoO<sub>3</sub>-based gas sensor exhibiting a p-type response at near-room temperature.
Pulsed laser deposition (PLD) at an elevated growth pressure of 8
Pascal and a substrate temperature of 550 °C was used to synthesize
high-quality, vertically aligned ultrathin one-dimensional α-MoO<sub>3</sub> nanorods on silicon dioxide (SiO<sub>2</sub>) substrates.
These MoO<sub>3</sub> nanorods show high sensitivity to NO<sub>2</sub> with a response value of 19.7% for 50 ppm of NO<sub>2</sub> at 35
°C. Moreover, the sensor demonstrates an ultralow detection limit
of 500 ppb at this temperature, underscoring its suitability for low-temperature,
high-performance gas sensing applications and facilitating progress
in environmental monitoring technology.