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Molecular Lithography through DNA-Mediated Etching and Masking of SiO2

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journal contribution
posted on 10.08.2011, 00:00 by Sumedh P. Surwade, Shichao Zhao, Haitao Liu
We demonstrate a new approach to pattern transfer for bottom-up nanofabrication. We show that DNA promotes/inhibits the etching of SiO2 at the single-molecule level, resulting in negative/positive tone pattern transfers from DNA to the SiO2 substrate.

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