posted on 2024-09-16, 17:08authored byZhichao Weng, Robert Wallis, Bryan Wingfield, Paul Evans, Piotr Baginski, Jaspreet Kainth, Andrey E. Nikolaenko, Lok Yi Lee, Joanna Baginska, William P. Gillin, Ivor Guiney, Colin J. Humphreys, Oliver Fenwick
The development of
the memristor has generated significant interest
due to its non-volatility, simple structure, and low power consumption.
Memristors based on graphene offer atomic monolayer thickness, flexibility,
and uniformity and have attracted attention as a promising alternative
to contemporary field-effect transistor (FET) technology in applications
such as logic and memory devices, achieving higher integration density
and lower power consumption. The use of graphene as electrodes in
memristors could also increase robustness against degradation mechanisms,
including oxygen vacancy diffusion to the electrode and unwanted metal
ion diffusion. However, to realize this technological transformation,
it is necessary to establish a scalable, robust, and cost-effective
device fabrication process. Here we report the direct growth of high-quality
monolayer graphene on sapphire wafers in a mass-producible, contamination-free,
and transfer-free manner, using a commercially available metal–organic
chemical vapor deposition (MOCVD) system. By taking advantage of this
approach, graphene-electrode based memristors are developed, and all
the processes used in the device fabrication incorporating graphene
electrodes can be performed at wafer scale. The graphene electrode-based
memristor demonstrates promising characteristics in terms of endurance,
retention, and ON/OFF ratio. This work presents a possible and viable
route to achieving robust graphene-based memristors in a commercially
and technologically sustainable manner, paving the way for the realization
of more powerful and compact integrated graphene electronics in the
future.