posted on 2016-07-28, 00:00authored byBenjamin
C. Hoffman, Terry McAfee, Brad R. Conrad, Marsha A. Loth, John E. Anthony, Harald W. Ade, Daniel B. Dougherty
Spatial variations in surface potential
are measured with Kelvin
probe force microscopy for thin films of 2,8-difluoro-5,11-bis(triethylsilylethynyl)anthradithiophenes
(diF-TES-ADT) grown on SiO2 and silane-treated SiO2 substrates by organic molecular beam deposition. The variations
are observed both between and within grains of the polycrystalline
organic film and are quantitatively different than electrostatic variations
on the substrate surfaces. The skewness of surface potential distributions
is larger on SiO2 than on HMDS-treated substrates. This
observation is attributed to the impact of substrate functionalization
on minimizing intrinsic crystallographic defects in the organic film
that can trap charge.