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Improved Graphene Blisters by Ultrahigh Pressure Sealing
journal contribution
posted on 2020-08-06, 22:21 authored by Yolanda Manzanares-Negro, Pablo Ares, Miriam Jaafar, Guillermo López-Polín, Cristina Gómez-Navarro, Julio Gómez-HerreroGraphene
is a very attractive material for nanomechanical devices
and membrane applications. Graphene blisters based on silicon oxide
microcavities are a simple but relevant example of nanoactuators.
A drawback of this experimental setup is that gas leakage through
the graphene–SiO2 interface contributes significantly
to the total leak rate. Here, we study the diffusion of air from pressurized
graphene drumheads on SiO2 microcavities and propose a
straightforward method to improve the already strong adhesion between
graphene and the underlying SiO2 substrate, resulting in
reduced leak rates. This is carried out by applying controlled and
localized ultrahigh pressure (>10 GPa) with an atomic force microscopy
diamond tip. With this procedure, we are able to significantly approach
the graphene layer to the SiO2 surface around the drumheads,
thus enhancing the interaction between them, allowing us to better
seal the graphene–SiO2 interface, which is reflected
in up to ∼ 4 times lower leakage rates. Our work opens an easy
way to improve the performance of graphene as a gas membrane on a
technological relevant substrate such as SiO2.
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Keywords
graphene drumheadsforce microscopy diamond tipUltrahigh Pressure Sealing Graphenesilicon oxide microcavitiesleak ratesgraphene layermembrane applicationsSiO 2Graphene Blistersleakage ratesSiO 2 substrategas leakageGraphene blistersgas membraneSiO 2 microcavitiesleak ratenanomechanical devicesSiO 2 surface
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