American Chemical Society
Browse
ic3c04121_si_002.pdf (708.51 kB)

Formation of Strong Boron Lewis Acid Sites on Silica

Download (708.51 kB)
journal contribution
posted on 2024-03-07, 14:36 authored by Kavyasripriya K. Samudrala, Manjur O. Akram, Jason L. Dutton, Caleb D. Martin, Matthew P. Conley
Bis(1-methyl-ortho-carboranyl)borane (HBMeoCb2) is a very strong Lewis acid that reacts with the isolated silanols present on silica partially dehydroxylated at 700 °C (SiO2‑700) to form the well-defined Lewis site MeoCb2B(OSi) (1) and H2. 11B{1H} magic-angle spinning (MAS) nuclear magnetic resonance (NMR) data of 1 are consistent with that of a three-coordinate boron site. Contacting 1 with OPEt3 (triethylphosphine oxide TEPO) and measuring 31P{1H} MAS NMR spectra show that 1 preserves the strong Lewis acidity of HBMeoCb2. Hydride ion affinity and fluoride ion affinity calculations using small molecules analogs of 1 also support the strong Lewis acidity of the boron sites in this material. Reactions of 1 with Cp2Hf(13CH3)2 show that the Lewis sites are capable of abstracting methide groups from Hf to form [Cp2Hf–13CH3][H313C–B(MeoCb2)OSi], but with a low overall efficiency.

History