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Formation of λ-DNA's in Parallel- and Crossed-Line Arrays by Molecular Combing and Scanning-Probe Lithography

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journal contribution
posted on 12.07.2006, 00:00 by Minjung Shin, Chilwoo Kwon, Seong Kyu Kim, Hyung Jin Kim, Yonghan Roh, Byungyou Hong, Jong Bae Park, Haeseong Lee
With the combination of a molecular combing technique and scanning-probe lithographic patterning, λ-DNA's were stretched and aligned to form line array structures on patterned organic monolayer surfaces. The pattern was generated by anodizing a silicon surface using scanning-probe lithography to implant a polar organic layer in the middle of a nonpolar layer. The molecule in the polar layer, (aminopropyl)triethoxysilane (APS), has a −NH3+ terminal group, which interacts strongly with phosphate backbone of DNA and provides a site for selective attachment of DNA. When parallel lines of APS were patterned, followed by combing along the lines, a single DNA was attached from the very top of each line and stretched along the line all the way to the bottom. The DNA−APS interaction was strong enough to withstand the second combing applied perpendicular to the first one. Thereby, the crossed-line array of DNA's was formed on the crossed-line array pattern of APS on a silicon substrate.

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