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Fluorinated Acid Amplifiers for EUV Lithography

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posted on 29.07.2009, 00:00 authored by Seth Kruger, Sri Revuru, Craig Higgins, Sarah Gibbons, Daniel A. Freedman, Wang Yueh, Todd R. Younkin, Robert L. Brainard
Fluorinated Acid Amplifiers for EUV Lithography

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Fluorinated Acid Amplifiers for EUV Lithography
Journal of the American Chemical SocietyJournal of the American Chemical Society

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AmplifierEUV LithographyFluorinated

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