High-performance
field-effect transistors based on two-dimensional
(2D) semiconductors have been realized, but they often exhibit inherent
transport property. Local p- and n-doping on same the semiconductor
is essential for realizing the basic components of integrated circuits,
such as diodes and logic inverters. However, existing doping technologies
on 2D semiconductors are complex or expensive. Here, a simple and
low-cost method for p-doping of few-layer MoTe2 transistor
is demonstrated. Air heating at a low temperature of 100 °C induces
a continuous and efficient modulation of carrier polarity from n-
to p-type, and the doping effect can be controlled by adjusting the
heating time. The hole mobility of MoTe2 is significantly
enhanced from 0.3 to 25.8 cm2 V–1 s–1 by 2 orders of magnitude. The doping effect originates
from the surface oxidation of few-layer MoTe2. Based on
the method, MoTe2-based logic devices were fabricated,
realizing p–n diode with an ideality factor of 1.3 and rectification
ratio of ∼3 × 103 and complementary inverters
with a high gain of ∼108. The facile method shows great potential
for developing high-performance electronic devices with 2D semiconductors.