Fabrication of High χ‑Low N Block Copolymers with Thermally Stable Sub‑5 nm Microdomains Using Polyzwitterion as a Constituent Block

In this work, we used zwitterionic poly­(4-vinylpyridine) propane-1-sulfonate (PVPS) as a constituent block to construct high χ-low N block copolymers (BCPs) with different neutral polymers as the other block, including polystyrene (PS), poly­(ethylene oxide) (PEO), and poly­(l-lactide) (PLLA). Lamellar structures with sub-5 nm microdomains were observed in all three types of BCPs. Due to the tendency of self-aggregation induced by electrostatic interaction in polyzwitterion, the Flory–Huggins parameters (χ) between PVPS and most neutral polymers are relatively high, which provides a facile and efficient way to fabricate high χ-low N BCPs. In addition, the dimension of the sub-5 nm structures formed in PVPS-containing BCPs showed high thermal stability with a small fluctuation (±0.1 nm) of domain spacings upon heating.