posted on 2017-07-24, 00:00authored byYuting Shen, Tao Xu, Xiaodong Tan, Jun Sun, Longbing He, Kuibo Yin, Yilong Zhou, Florian Banhart, Litao Sun
With the rapid development of nanoscale
structuring technology,
the precision in the etching reaches the sub-10 nm scale today. However,
with the ongoing development of nanofabrication the etching mechanisms
with atomic precision still have to be understood in detail and improved.
Here we observe, atom by atom, how preferential facets form in CaO
crystals that are etched by an electron beam in an in situ high-resolution
transmission electron microscope (HRTEM). An etching mechanism under
electron beam irradiation is observed that is surprisingly similar
to chemical etching and results in the formation of nanofacets. The
observations also explain the dynamics of surface roughening. Our
findings show how electron beam etching technology can be developed
to ultimately realize tailoring of the facets of various crystalline
materials with atomic precision.