American Chemical Society
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Electron-Beam Irradiation of Cinnamate Films Affords Nanoscale Patterned Substrates for Use in Devices and as Scaffolds in Tissue Engineering

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journal contribution
posted on 2020-06-12, 14:38 authored by Karl-Philipp Strunk, N. Maximilian Bojanowski, Christian Huck, Markus Bender, Lisa Veith, Michael Tzschoppe, Jan Freudenberg, Irene Wacker, Rasmus R. Schröder, Annemarie Pucci, Christian Melzer, Uwe H. F. Bunz
The fabrication of electronic, photonic, and metamaterial-based devices, or tissue engineering requires the controlled deposition and patterning of materials. Electron-beam lithography (EBL) offers unprecedented miniaturization of those devices because of its high resolution. We present a concept to induce a classic photochemical reaction in condensed matter via EBL. We investigate the response of a tetrameric cinnamate monomer in thin films toward photon and electron radiation. In the solid state, photoexcitation and electron bombardment similarly induce [2 + 2] cycloadditions, forming insoluble truxilic acid esters, as shown via IR spectroscopy measurements. Subsequently, we employed the investigated material as an electron-beam resist, showing resistance against wet-chemical etchants. Structures with resolution down to 60 nm were obtained, not achievable with conventional photolithography, proving that [2 + 2] cycloaddition of cinnamic acid containing compounds is suitable for applications in the field of EBL.