posted on 2013-02-12, 00:00authored bySujitra Pookpanratana, Joseph W. F. Robertson, Cherno Jaye, Daniel A. Fischer, Curt A. Richter, Christina A. Hacker
We have used flip chip lamination (FCL) to form monolayer
and bilayer
molecular junctions of carboxylic acid-containing molecules with Cu
atom incorporation. Carboxylic acid-terminated monolayers are self-assembled
onto ultrasmooth Au by using thiol chemistry and grafted onto n-type
Si. Prior to junction formation, monolayers are physically characterized
by using polarized infrared absorption spectroscopy, X-ray photoelectron
spectroscopy, and near-edge X-ray absorption fine structure spectroscopy,
confirming the molecular quality and functional group termination.
FCL was used to form monolayer junctions onto H-terminated Si or bilayer
junctions of carboxylic acid monolayers on Au and Si. From the electrical
measurements, we find that the current through the junction is attenuated
as the effective molecular length within the junction increases, indicating
that molecules are electrically active within the junction. We find
that the electronic transport through the bilayer junction saturates
at very thick effective distances possibly because of another electron-transport
mechanism that is not nonresonant tunneling as a result of trapped
defects or sequential tunneling. In addition, bilayer junctions are
fabricated with and without Cu atoms, and we find that the electron
transport is not distinguishably different when Cu atoms are within
the bilayer.