posted on 2015-01-08, 00:00authored byJunji Hyodo, Ken Tominaga, Jong-Eun Hong, Shintaro Ida, Tatsumi Ishihara
The
effects of tensile strain on the electronic properties of Cu- and
Ga-doped Pr1.9NiO4 (PNCG) were investigated.
The difference in the thermal expansion coefficient between PNCG (α
= 13.5–13.9 × 10–6 K–1) and Au (α = 14.2 × 10–6 K–1) can induce tensile strain in PNCG, resulting in changes in electrical
conductivity. Hall-effect measurements indicated that the tensile
strain stabilized the oxidized state of PNCG, and the electrical conductivity
increased because of the increased hole concentration. This suggests
that the tensile strain affected the valence numbers of cations in
PNCG, increasing the hole concentration and raising the conductivity.
Furthermore, the BO6 octahedral distance in the K2NiF4 structure was increased by the induced strain, decreasing
the hole mobility.