posted on 2019-07-24, 14:37authored byHung K. Nguyen, Shin Sugimoto, Asuka Konomi, Manabu Inutsuka, Daisuke Kawaguchi, Keiji Tanaka
The
relaxation dynamics of polyisoprene (PI) and nitrile butadiene
rubber (NBR) chains at the SiO2 interface were directly
probed as a function of distance from the SiO2 surface
using time-resolved evanescent wave-induced fluorescence anisotropy,
dielectric relaxation spectroscopy, and sum-frequency generation spectroscopy.
We found the presence of the dynamics gradient of chains in the interfacial
region with the SiO2 surface and tried to assign it to
the two kinds of adsorbed chains, namely, loosely and strongly adsorbed,
at the interface. The segmental relaxation of chains in the strongly
adsorbed layer at the interface could be slower than that of bulk
chains by more than 10 orders.