posted on 2021-06-10, 19:05authored byTaylor
C. Stimpson, Daniel A. Osorio, Emily D. Cranston, Jose M. Moran-Mirabal
To
engineer tunable thin-film materials, the accurate measurement
of their mechanical properties is crucial. However, characterizing
the elastic modulus with current methods is particularly challenging
for sub-micrometer thick films and hygroscopic materials because they
are highly sensitive to environmental conditions and most methods
require free-standing films which are difficult to prepare. In this
work, we directly compared three buckling-based methods to determine
the elastic moduli of supported thin films: (1) biaxial thermal shrinking,
(2) uniaxial thermal shrinking, and (3) the mechanically compressed,
strain-induced elastic buckling instability for mechanical measurements
(SIEBIMM) method. Nanobiocomposite model films composed of cellulose
nanocrystals (CNCs) and polyethyleneimine (PEI) were assembled using
layer-by-layer deposition to control composition and thickness. The
three buckling-based methods yielded the same trends and comparable
values for the elastic moduli of each CNC–PEI film composition
(ranging from 15 to 44 GPa, depending on film composition). This suggests
that the methods are similarly effective for the quantification of
thin-film mechanical properties. Increasing the CNC content in the
films statistically increased the modulus; however, increasing the
PEI content did not lead to significant changes. For the CNC–PEI
system, the standard deviation of elastic moduli determined from SIEBIMM
was 2–4 times larger than that for thermal shrinking, likely
due to extensive cracking due to the different stress applied to the
film when subjected to compression of a relaxed substrate versus the
shrinking of a pre-strained substrate. These results show that biaxial
thermal shrinking is a reliable method for the determination of the
mechanical properties of thin films with a simple implementation and
analysis and low sensitivity to small deviations in the input parameter
values, such as film thickness or substrate modulus.