The coupled relationship between carrier and phonon scattering
severely limits the thermoelectric performance of n-type GeTe materials.
Here, we provide an efficient strategy to enlarge grains and induce
vacancy clusters for decoupling carrier-phonon scattering through
the annealing optimization of n-type GeTe-based materials. Specifically,
boundary migration is used to enlarge grains by optimizing the annealing
time, while vacancy clusters are induced through the aggregation of
Ge vacancies during annealing. Such enlarged grains can weaken carrier
scattering, while vacancy clusters can strengthen phonon scattering,
leading to decoupled carrier-phonon scattering. As a result, a ratio
between carrier mobility and lattice thermal conductivity of ∼492.8
cm3 V–1 s–1 W–1 K and a peak ZT of ∼0.4 at 473 K are achieved
in Ge0.67Pb0.13Bi0.2Te. This work
reveals the critical roles of enlarged grains and induced vacancy
clusters in decoupling carrier-phonon scattering and demonstrates
the viability of fabricating high-performance n-type GeTe materials
via annealing optimization.