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Controlled Spacing between Nanopatterned Regions in Block Copolymer Films Obtained by Utilizing Substrate Topography for Local Film Thickness Differentiation
journal contribution
posted on 2019-09-17, 11:36 authored by Elisheva Michman, Marcel Langenberg, Roland Stenger, Meirav Oded, Mark Schvartzman, Marcus Müller, Roy ShenharVarious
types of devices require hierarchically nanopatterned substrates,
where the spacing between patterned domains is controlled. Ultraconfined
films exhibit extreme morphological sensitivity to slight variations
in film thickness when the substrate is highly selective toward one
of the blocks. Here, it is shown that using the substrate’s
topography as a thickness differentiating tool enables the creation
of domains with different surface patterns in a fully controlled fashion
from a single, unblended block copolymer. This approach is applicable
to block copolymers of different compositions and to different topographical
patterns and thus opens numerous possibilities for the hierarchical
construction of multifunctional devices.
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Utilizing Substrate TopographyUltraconfined films exhibitLocal Film Thickness DifferentiationNanopatterned RegionsControlled Spacingunblended block copolymerfilm thicknesstopographical patternsBlock Copolymer Films Obtainedhierarchically nanopatterned substratesblock copolymerssurface patternsmultifunctional devices
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