Bioactive Polyelectrolyte Multilayers: Hyaluronic Acid Mediated B Lymphocyte Adhesion
journal contributionposted on 13.09.2010, 00:00 by Fernando C. Vasconcellos, Albert J. Swiston, Marisa M. Beppu, Robert E. Cohen, Michael F. Rubner
A strategy was developed to produce thin, biopolymer-based polyelectrolyte multilayer films, based on hyaluronic acid and chitosan, that are able to effectively bind B lymphocytes. These films explore CD44−hyaluronate interactions and provide a method to make surface-bound B cell arrays without the need for nonselective covalent chemistry. The rational design of these films using solution deposition variables, such as ionic strength and pH, allows one to maximize and fine tune this binding efficiency ex vivo. This work suggests two important conditions for successfully attaching B cells to hyaluronate-containing polyelectrolyte multilayer films: (1) hyaluronic acid is required for the proposed CD44-mediated binding mechanism, and (2) hyaluronic acid deposition conditions that favor loops and tails, such as low pH and with added salt, result in more available CD44 binding ligands and higher cell binding efficiency. Chitosan-terminated films prepared without NaCl in the deposition solutions and hyaluronic acid-terminated films prepared with salt, both under pH 3.0 assembly conditions, presented a similar high lymphocyte binding efficiency. In the former case, however, the binding strength was weaker due to a significant electrostatic contribution to the binding. Bioactive polyelectrolyte multilayers for selective binding of lymphocytes hold great promise in fields ranging from cell-based biosensors to immune system engineering.
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pH 3.0 assembly conditionsdeposition solutionsMediated B Lymphocyte AdhesionA strategybind B lymphocytescell binding efficiencyBioactive polyelectrolyte multilayerslymphocyte binding efficiencybinding efficiencyBioactive Polyelectrolyte Multilayerssolution deposition variablesbinding strengthB cellsCD 44 binding ligandssystem engineeringfilmfavor loopsnonselective covalent chemistryacid deposition conditions