posted on 2020-04-27, 14:07authored byJulian Heep, Jan-Niclas Luy, Christian Länger, Jannick Meinecke, Ulrich Koert, Ralf Tonner, Michael Dürr
The
reaction of a methyl-substituted benzylazide on the silicon
(001) surface was investigated by means of X-ray photoelectron spectroscopy
(XPS), scanning tunneling microscopy (STM), and density functional
theory (DFT)-based computations. It was found that the reaction takes
place via an intermediate state, which could be experimentally observed
at low temperatures. XPS analysis showed that at temperatures of 150
K and above, the azide further reacts on the silicon surface via abstraction
of N2. The final state sees the remaining nitrogen atom
of the adsorbate binding covalently to the surface. In the STM images,
this final state is associated with two different adsorption configurations.
In comparison with DFT calculations, these two configurations are
assigned to the molecule being bound via the nitrogen atom only and
to a configuration with the molecule bound to the substrate via the
nitrogen atom and carbon ring simultaneously.