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Tris(phosphino)borato Silver(I) Complexes as Precursors for Metallic Silver Aerosol-Assisted Chemical Vapor Deposition
journal contribution
posted on 2008-04-07, 00:00 authored by Matthew
N. McCain, Sven Schneider, Michael R. Salata, Tobin J. MarksA series of light- and air-stable tris(phosphino)borato silver(I)
complexes has been synthesized, structurally and spectroscopically
characterized, and implemented in the growth of low resistivity metallic
silver thin films by aerosol-assisted chemical vapor deposition (AACVD).
Of the four complexes in the series, [RB(CH2PR′2)3]AgPEt3 (R = Ph (1, 3), nBu (2, 4); R′ = Ph (1, 2), iPr (3, 4), complexes 1 and 2 have been characterized by single-crystal
X-ray diffraction. Complex 2 represents a significant
improvement over previously available nonfluorinated Ag precursors,
owing to ease of handling and efficient film deposition characteristics.
Thermogravimetric analysis (TGA) shows that the thermolytic properties
of these complexes can be significantly modified by altering the ligand
structure. Polycrystalline cubic-phase Ag thin films were grown on
glass, MgO(100), and 52100 steel substrates. Ag films of thicknesses
3 µm, grown at rates of 14–18 nm/min, exhibit low levels
of extraneous element contamination by X-ray photoelectron spectroscopy
(XPS). Atomic force microscopy (AFM) and scanning electron microscopy
(SEM) indicate that film growth proceeds primarily via an island growth
(Volmer–Weber) mechanism.
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Keywords
thicknesses 3 µ mthermolytic propertiesscanning electron microscopy52100 steel substratescomplexRBfilm growth proceedsXPSComplex 2seriesPhisland growthligand structureAFMelement contaminationAg filmsAtomic force microscopyAACVDSEMfilm deposition characteristicsnonfluorinated Ag precursorstrisTGAThermogravimetric analysis
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