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Spontaneous Additive Nanopatterning from Solution Route Using Selective Wetting
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posted on 2018-07-12, 00:00 authored by Hyeonho Jeong, Hanul Moon, Han-Jung Kim, Min Yoon, Chang-Goo Park, Yong Suk Oh, Hyung Jin Sung, Dae-Geun Choi, Seunghyup YooNanopatterns
of functional materials have successfully led innovations
in a wide range of fields, but further exploration of their full potential
has often been limited because of complex and cost-inefficient patterning
processes. We here propose an additive nanopatterning process of functional
materials from solution route using selective wetting phenomenon.
The proposed process can produce nanopatterns as narrow as 150 nm
with high yield over large area at ultrahigh process speed, that is,
the speed of solution dragging, of up to ca. 4.6 m·min–1. The process is highly versatile that it can utilize a wide range
of solution materials, control vertical structures including pattern
thickness and multistacks, and produce nanopatterns on various substrates
with emerging form factors such as foldability and disposability.
The solution patterning in nanoscale by selective wetting is enabled
by corresponding surface energy patterns in high contrast that are
achieved by one-step imprinting onto hydrophobic/hydrophilic bilayers.
The mechanisms and control parameters for the solution patterning
are revealed by fluid-dynamic simulation. With the aforementioned
advantages, we demonstrate 25 400 pixel-per-inch light-emitting pixel
arrays and a plasmonic color filter of 10 cm × 10 cm area on
a plastic substrate as potential applications.