mz8b00119_si_001.pdf (776 kB)
Simultaneous In-Film Polymer Synthesis and Self-Assembly for Hierarchical Nanopatterns
journal contribution
posted on 2018-04-24, 00:00 authored by Zhe Qiang, Sahil A. Akolawala, Muzhou WangA key requirement for practical applications
of nanostructured
block copolymer (BCP) self-assembly is the ability to generate complex
geometries including different shapes and diverse sizes across one
substrate surface. This has been difficult because spatial control
over the underlying chemistry of the BCP has been limited. Here, we
demonstrate a photocontrolled in-film polymerization
process in the presence of monomer vapor for synthesizing homopolymers
in self-assembled BCP films. The homopolymers blend with BCPs and
alter the nanopatterns by changing the underlying polymer chemistry
and composition. We apply this technique to a variety of BCPs including
polystyrene-b-polyisoprene-b-polystyrene,
polystyrene-b-poly(methyl methacrylate), and polystyrene-b-poly(4-vinylpyridine). The region of in-film polymerization
can be modulated by the location of irradiation using photomasks for
obtaining distinct morphologies on one substrate, providing a new
platform for hierarchically manipulating nanopatterns within the self-assembled
BCP thin film as well as opening up a new area for radical polymerizations
of monomers within such geometrically confined, swollen films.
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monomer vaporsynthesizing homopolymersself-assembled BCP filmssubstrate surfacepolymer chemistryphotocontrolled in-film polymerization processHierarchical NanopatternspolystyreneSimultaneous In-Film Polymer Synthesisnanostructured block copolymerin-film polymerizationself-assembled BCPhomopolymers blend
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