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Photolabile Dendrimers Using o-Nitrobenzyl Ether Linkages

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journal contribution
posted on 2000-01-29, 00:00 authored by Mario Smet, Li-Xin Liao, Wim Dehaen, Dominic V. McGrath
Benzyl aryl ether dendrimers containing photosensitive, veratryl-based o-nitrobenzyl AB linkages (bold bonds) were prepared to the third generation and shown to undergo site-specific degradation when irradiated with ultraviolet light.

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