nl049209r_si_002.tif (768.58 kB)
Ordered Block-Copolymer Assembly Using Nanoimprint Lithography
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posted on 2004-09-08, 00:00 authored by Hong-Wei Li, Wilhelm T. S. HuckNanoimprint lithography and self-assembly of poly(styrene)-block-poly(methyl methacrylate) (PS-b-PMMA) diblock copolymer are combined to
induce order in the phase-separated domains. Tailored periodic arrays of poly(methyl methacrylate) (PMMA) cylinders normal or parallel to
neutralized silicon surfaces can be formed inside the gap of imprint molds. This method opens up a new route to the controlled phase
separation of block copolymers with precise placement of the phase-separated domains.