Ordered Block-Copolymer Assembly Using Nanoimprint Lithography

2004-09-08T00:00:00Z (GMT) by Hong-Wei Li Wilhelm T. S. Huck
Nanoimprint lithography and self-assembly of poly(styrene)-block-poly(methyl methacrylate) (PS-b-PMMA) diblock copolymer are combined to induce order in the phase-separated domains. Tailored periodic arrays of poly(methyl methacrylate) (PMMA) cylinders normal or parallel to neutralized silicon surfaces can be formed inside the gap of imprint molds. This method opens up a new route to the controlled phase separation of block copolymers with precise placement of the phase-separated domains.