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Nanocontact Electrification through Forced Delamination of Dielectric Interfaces

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journal contribution
posted on 2010-12-28, 00:00 authored by Jesse J. Cole, Chad R. Barry, Xinyu Wang, Heiko O. Jacobs
This article reports patterned transfer of charge between conformal material interfaces through a concept referred to as nanocontact electrification. Nanocontacts of different size and shape are formed between surface-functionalized polydimethylsiloxane (PDMS) stamps and other dielectric materials (PMMA, SiO2). Forced delamination and cleavage of the interface yields a well-defined charge pattern with a minimal feature size of 100 nm. The process produces charged surfaces and associated fields that exceed the breakdown strength of air, leading to strong long-range adhesive forces and force−distance curves, which are recorded over macroscopic distances. The process is applied to fabricate charge-patterned surfaces for nanoxerography demonstrating 200 nm resolution nanoparticle prints and applied to thin film electronics where the patterned charges are used to shift the threshold voltages of underlying transistors.

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