nn0c00696_si_001.pdf (3.38 MB)
Macroscopic Alignment of Block Copolymers on Silicon Substrates by Laser Annealing
journal contribution
posted on 2020-03-17, 18:11 authored by Arkadiusz
A. Leniart, Przemyslaw Pula, Andrzej Sitkiewicz, Pawel W. MajewskiLaser
annealing is a competitive alternative to conventional oven
annealing of block copolymer (BCP) thin films enabling rapid acceleration
and precise spatial control of the self-assembly process. Localized
heating by a moving laser beam (zone annealing), taking advantage
of steep temperature gradients, can additionally yield aligned morphologies.
In its original implementation it was limited to specialized germanium-coated
glass substrates, which absorb visible light and exhibit low-enough
thermal conductivity to facilitate heating at relatively low irradiation
power density. Here, we demonstrate a recent advance in laser zone
annealing, which utilizes a powerful fiber-coupled near-IR laser source
allowing rapid BCP annealing over a large area on conventional silicon
wafers. The annealing coupled with photothermal shearing yields macroscopically
aligned BCP films, which are used as templates for patterning metallic
nanowires. We also report a facile method of transferring laser-annealed
BCP films onto arbitrary surfaces. The transfer process allows patterning
substrates with a highly corrugated surface and single-step rapid
fabrication of multilayered nanomaterials with complex morphologies.
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exhibit low-enoughgermanium-coated glass substrateslaser-annealed BCP filmstemperature gradientsBlock CopolymersBCP filmsself-assembly processtransfer processLaser Annealing Laser annealingpatterning substratesphotothermal shearing yieldsSilicon Substrateslaser beamBCP annealingirradiation power densitysilicon wafersnear-IR laser sourceoven annealinglaser zone annealingblock copolymerLocalized heatingMacroscopic Alignment
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