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Functional Changes during Electron-Beam Lithography of Biotinylated Poly(ethylene glycol) Thin Films
journal contribution
posted on 2019-09-16, 13:42 authored by Xinpei Wu, Feiyue Teng, Matthew LiberaIn
contrast to photolithography where particular wavelengths of
light can couple to specific photochemistries, electron-beam lithography
can drive competing chemistries. To separate surface-grafting, cross-linking,
and chemical functionality, we studied the effects of 2 keV electrons
on thin films of poly(ethylene glycol) end-functionalized with hydroxyls
(PEG-OH) or biotins (PEG-B). Similarities in the dose-dependent thickness
changes of the patterned PEGs indicate that surface grafting and cross-linking
primarily involve the ethylene oxide main chain. While higher doses
create thicker patterns with more biotin, the concurrent increase
in thiol reactivity indicates that cross-linking competes with biotin
degradation. The dose window for optimal e-beam patterning of biotinylated
PEG is very narrow. Biotin is entirely consumed at higher doses. Its
modified functionality is reactive with 5-((2-(and-3)-S-(acetylmercapto) succinoyl) amino) (SAMSA). This effect creates
a dose-dependent orthogonal functionality that can be patterned from
a single precursor thin film.
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Keywords
ethylene oxideelectron-beam lithographybiotin degradationfilmdose-dependent thickness changesElectron-Beam LithographyPEG-Bcross-linkingPEG-OHe-beam patterning2 keV electronsdose-dependent orthogonal functionalitybiotinylated PEGFunctional ChangesglycolSAMSAdose windowThin Filmschemical functionalitythiol reactivity
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