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Argon Cluster Ion Source Evaluation on Lipid Standards and Rat Brain Tissue Samples
journal contribution
posted on 2013-08-20, 00:00 authored by Claudia Bich, Rasmus Havelund, Rudolf Moellers, David Touboul, Felix Kollmer, Ewald Niehuis, Ian S. Gilmore, Alain BrunelleArgon cluster ion sources for sputtering
and secondary ion mass spectrometry use projectiles consisting of
several hundreds of atoms, accelerated to 10–20 keV, and deposit
their kinetic energy within the top few nanometers of the surface.
For organic materials, the sputtering yield is high removing material
to similar depth. Consequently, the exposed new surface is relatively
damage free. It has thus been demonstrated on model samples that it
is now really possible to perform dual beam depth profiling experiments
in organic materials with this new kind of ion source. Here, this
possibility has been tested directly on tissue samples, 14 μm
thick rat brain sections, allowing primary ion doses much larger than
the so-called static secondary ion mass spectrometry (SIMS) limit
and demonstrating the possibility to enhance the sensitivity of time-of-flight
(TOF)-SIMS biological imaging. However, the depth analyses have also
shown some variations of the chemical composition as a function of
depth, particularly for cholesterol, as well as some possible matrix
effects due to the presence or absence of this compound.
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depth analysesLipid StandardssurfaceTOFion dosesion mass spectrometry use projectilesSIMSmatrix effectsion mass spectrometrymaterialbeam depthtissue samplesrat brain sectionschemical compositionArgon Cluster Ion Source Evaluation14 μ mmodel samplesRat Brain Tissue SamplesArgon cluster ion sourcesion source
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