American Chemical Society
Browse
nn101468e_si_001.pdf (224.1 kB)

A New Mechanism of Atomic Manipulation: Bond-Selective Molecular Dissociation via Thermally Activated Electron Attachment

Download (224.1 kB)
journal contribution
posted on 2010-12-28, 00:00 authored by Sumet Sakulsermsuk, Peter A. Sloan, Richard E. Palmer
We report a new mechanism of (bond-selective) atomic manipulation in the scanning tunneling microscope (STM). We demonstrate a channel for one-electron-induced C−Cl bond dissociation in chlorobenzene molecules chemisorbed on the Si(111)-7 × 7 surface, at room temperature and above, which is thermally activated. We find an Arrhenius thermal energy barrier to one-electron dissociation of 0.8 ± 0.2 eV, which we correlate explicitly with the barrier between chemisorbed and physisorbed precursor states of the molecule. Thermal excitation promotes the target molecule from a state where one-electron dissociation is suppressed to a transient state where efficient one-electron dissociation, analogous to the gas-phase negative-ion resonance process, occurs. We expect the mechanism will be obtained in many surface systems, and not just in STM manipulation, but in photon and electron beam stimulated (selective) chemistry.

History