10.1021/acs.jpcc.6b04955.s001
Tsutomu Ohta
Tsutomu
Ohta
Masahiro Shibuta
Masahiro
Shibuta
Hironori Tsunoyama
Hironori
Tsunoyama
Toyoaki Eguchi
Toyoaki
Eguchi
Atsushi Nakajima
Atsushi
Nakajima
Charge Transfer Complexation of Ta-Encapsulating Ta@Si<sub>16</sub> Superatom with C<sub>60</sub>
American Chemical Society
2016
superatomic CT
XPS results
UPS measurements
superatomic charge transfer
building block
Ta
C 60 molecule
720 K
C 60 fullerene film
heat treatment
chemical states
C 60
charge Transfer Complexation
oxygen exposure
ambient oxygen
photoelectron spectroscopies
chemical robustness
2016-07-08 13:56:01
Journal contribution
https://acs.figshare.com/articles/journal_contribution/Charge_Transfer_Complexation_of_Ta-Encapsulating_Ta_Si_sub_16_sub_Superatom_with_C_sub_60_sub_/3474833
The tantalum-encapsulating Si<sub>16</sub> cage nanocluster superatom
(Ta@Si<sub>16</sub>) has been a promising candidate for a building
block of nanocluster-based functional materials. Its chemical states
of Ta@Si<sub>16</sub> deposited on an electron acceptable C<sub>60</sub> fullerene film were evaluated by X-ray and ultraviolet photoelectron
spectroscopies (XPS and UPS, respectively). XPS results for Si, Ta,
and C showed that Ta@Si<sub>16</sub> combines with a single C<sub>60</sub> molecule to form the superatomic charge transfer (CT) complex,
(Ta@Si<sub>16</sub>)<sup>+</sup>C<sub>60</sub><sup>–</sup>.
The high thermal and chemical robustness of the superatomic CT complex
has been revealed by the XPS and UPS measurements conducted before
and after heat treatment and oxygen exposure. Even when heated to
720 K or subjected to ambient oxygen, Ta@Si<sub>16</sub> retained
its original framework, forming oxides of Ta@Si<sub>16</sub> superatom.