Extended Arrays of Vertically Aligned Sub-10 nm Diameter [100] Si Nanowires by Metal-Assisted Chemical Etching
Zhipeng Huang
Xuanxiong Zhang
Manfred Reiche
Lifeng Liu
Woo Lee
Tomohiro Shimizu
Stephan Senz
Ulrich Gòˆsele
10.1021/nl802324y.s001
https://acs.figshare.com/articles/journal_contribution/Extended_Arrays_of_Vertically_Aligned_Sub_10_nm_Diameter_100_Si_Nanowires_by_Metal_Assisted_Chemical_Etching/2915092
Large-area high density silicon nanowire (SiNW) arrays were fabricated by metal-assisted chemical etching of silicon, utilizing anodic aluminum oxide (AAO) as a patterning mask of a thin metallic film on a Si (100) substrate. Both the diameter of the pores in the AAO mask and the thickness of the metal film affected the diameter of SiNWs. The diameter of the SiNWs decreased with an increase of thickness of the metal film. Large-area SiNWs with average diameters of 20 nm down to 8 nm and wire densities as high as 10<sup>10</sup> wires/cm<sup>2</sup> were accomplished. These SiNWs were single crystalline and vertically aligned to the (100) substrate. It was revealed by transmission electron microscopy that the SiNWs were of high crystalline quality and showed a smooth surface.
2008-09-10 00:00:00
diameter
AAO
anodic aluminum oxide
nm
density silicon nanowire
transmission electron microscopy
SiNW
metal film