Nanocontact Electrification through Forced Delamination of Dielectric Interfaces Jesse J. Cole Chad R. Barry Xinyu Wang Heiko O. Jacobs 10.1021/nn1016692.s001 https://acs.figshare.com/articles/journal_contribution/Nanocontact_Electrification_through_Forced_Delamination_of_Dielectric_Interfaces/2702146 This article reports patterned transfer of charge between conformal material interfaces through a concept referred to as nanocontact electrification. Nanocontacts of different size and shape are formed between surface-functionalized polydimethylsiloxane (PDMS) stamps and other dielectric materials (PMMA, SiO<sub>2</sub>). Forced delamination and cleavage of the interface yields a well-defined charge pattern with a minimal feature size of 100 nm. The process produces charged surfaces and associated fields that exceed the breakdown strength of air, leading to strong long-range adhesive forces and forceāˆ’distance curves, which are recorded over macroscopic distances. The process is applied to fabricate charge-patterned surfaces for nanoxerography demonstrating 200 nm resolution nanoparticle prints and applied to thin film electronics where the patterned charges are used to shift the threshold voltages of underlying transistors. 2010-12-28 00:00:00 dielectric materials feature size surface breakdown strength film electronics Nanocontact Electrification Dielectric InterfacesThis article reports interface yields macroscopic distances nanocontact electrification charge pattern threshold voltages PDMS conformal material interfaces 100 nm 200 nm resolution nanoparticle prints PMMA