Nanocontact Electrification through Forced Delamination of Dielectric Interfaces
Jesse J. Cole
Chad R. Barry
Xinyu Wang
Heiko O. Jacobs
10.1021/nn1016692.s001
https://acs.figshare.com/articles/journal_contribution/Nanocontact_Electrification_through_Forced_Delamination_of_Dielectric_Interfaces/2702146
This article reports patterned transfer of charge between conformal material interfaces through a concept referred to as nanocontact electrification. Nanocontacts of different size and shape are formed between surface-functionalized polydimethylsiloxane (PDMS) stamps and other dielectric materials (PMMA, SiO<sub>2</sub>). Forced delamination and cleavage of the interface yields a well-defined charge pattern with a minimal feature size of 100 nm. The process produces charged surfaces and associated fields that exceed the breakdown strength of air, leading to strong long-range adhesive forces and forceādistance curves, which are recorded over macroscopic distances. The process is applied to fabricate charge-patterned surfaces for nanoxerography demonstrating 200 nm resolution nanoparticle prints and applied to thin film electronics where the patterned charges are used to shift the threshold voltages of underlying transistors.
2010-12-28 00:00:00
dielectric materials
feature size
surface
breakdown strength
film electronics
Nanocontact Electrification
Dielectric InterfacesThis article reports
interface yields
macroscopic distances
nanocontact electrification
charge pattern
threshold voltages
PDMS
conformal material interfaces
100 nm
200 nm resolution nanoparticle prints
PMMA