10.1021/nn2003458.s001 Jungkil Kim Jungkil Kim Hee Han Hee Han Young Heon Kim Young Heon Kim Suk-Ho Choi Suk-Ho Choi Jae-Cheon Kim Jae-Cheon Kim Woo Lee Woo Lee Au/Ag Bilayered Metal Mesh as a Si Etching Catalyst for Controlled Fabrication of Si Nanowires American Chemical Society 2011 array crystal orientation Si Etching Catalyst Controlled Fabrication etching conditions reaction kinetics metal catalyst silicon wafers SiNW silicon nanowires 2011-04-26 00:00:00 Journal contribution https://acs.figshare.com/articles/journal_contribution/Au_Ag_Bilayered_Metal_Mesh_as_a_Si_Etching_Catalyst_for_Controlled_Fabrication_of_Si_Nanowires/2659828 Au/Ag bilayered metal mesh with arrays of nanoholes were devised as a catalyst for metal-assisted chemical etching of silicon. The present metal catalyst allows us not only to overcome drawbacks involved in conventional Ag-based etching processes, but also to fabricate extended arrays of silicon nanowires (SiNWs) with controlled dimension and density. We demonstrate that SiNWs with different morphologies and axial orientations can be prepared from silicon wafers of a given orientation by controlling the etching conditions. We explored a phenomenological model that explains the evolution of the morphology and axial crystal orientation of SiNWs within the framework of the reaction kinetics.