10.1021/nn2003458.s001
Jungkil Kim
Jungkil
Kim
Hee Han
Hee
Han
Young Heon Kim
Young Heon
Kim
Suk-Ho Choi
Suk-Ho
Choi
Jae-Cheon Kim
Jae-Cheon
Kim
Woo Lee
Woo
Lee
Au/Ag Bilayered Metal Mesh as a Si Etching Catalyst for Controlled Fabrication of Si Nanowires
American Chemical Society
2011
array
crystal orientation
Si Etching Catalyst
Controlled Fabrication
etching conditions
reaction kinetics
metal catalyst
silicon wafers
SiNW
silicon nanowires
2011-04-26 00:00:00
Journal contribution
https://acs.figshare.com/articles/journal_contribution/Au_Ag_Bilayered_Metal_Mesh_as_a_Si_Etching_Catalyst_for_Controlled_Fabrication_of_Si_Nanowires/2659828
Au/Ag bilayered metal mesh with arrays of nanoholes were devised as a catalyst for metal-assisted chemical etching of silicon. The present metal catalyst allows us not only to overcome drawbacks involved in conventional Ag-based etching processes, but also to fabricate extended arrays of silicon nanowires (SiNWs) with controlled dimension and density. We demonstrate that SiNWs with different morphologies and axial orientations can be prepared from silicon wafers of a given orientation by controlling the etching conditions. We explored a phenomenological model that explains the evolution of the morphology and axial crystal orientation of SiNWs within the framework of the reaction kinetics.